Grant: Research Tools and Instruments
Université de Sherbrooke
$82,544.00
Chemical mechanical planarization a technology enabler for devices, circuits and microsystems innovation
FY 2023-24
Summary
We request this grant to update our chemical mechanical polishing/planarization (CMP) tool to develop enabling technologies in the fields of quantum, AI, MEMS, epitaxy, photovoltaic, optoelectronic, photonic and advanced packaging. We acquired our Alpsitec E460 CMP tool in 2009, thanks to the NSERC RTI program and other funds. Since then, CMP is now holding a central position in our research. In the last six years, 20 HQPs, 8 doctoral students (PhD), 2 postdoctoral fellows (PDF), 3 master students (MSc), 6 undergraduate students (UG) and 1 research associate (RA) acquired a hands-on experience on our CMP tool to execute their projects. CMP is crucial to many projects now being carried out by our group and not other etching technique or integration process can replace it. This year, the system went down for weeks because of a failure of its control PC and electronics. Even though after the replacement of the control PC and a complete calibration of the tool by the manufacturer and our technical staff to bring it back to a proper operating condition, the tool now suffers from unexpected and unplanned shutdown and the original specifications and performances are not attainable with the current temporary configuration. The funding of this grant will permit an upgrade of our current CMP tool and its electronics, preventing this way many possible failures over the next five to ten years. This is the most cost-effective way to ensure the continuation of our research, based on the reliability of our current system and the required budget to acquire a new one. This grant will not only support the 8 co-applicants of this RTI, but also the 19 researchers across Canada that have ongoing NSERC funded research projects or similar in collaboration with Université de Sherbrooke, in which they will benefit from the use of the upgraded CMP tool. The academic community and industries in Canada will also have access to the tool that is made available in the 3iT clean room facility either by direct access or as a service. The CMC Canadian Microsystem Corporation also offers this technology through its platform.
Program
Research Tools and Instruments
Recipient
Location
Quebec, Canada
Recipient Type
Academia
Type
Grant
Source
NSERC's Awards Data
As published
Application id
RTI-2024-00374
Name nom
Ecoffey, Serge
Department département
Département de génie électrique et génie informatique
Organization id
68
Institution établissement
Université de Sherbrooke
Province en
Québec
Province fr
Québec
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2023
Competition year année de concours
2024
Award amount
82544
Program id
RTI
Program name en
Research Tools and Instruments
Program name fr
Outils et instruments de recherche
Group en
DISCOVERY RESEARCH
Group fr
RECHERCHE AXÉE SUR LA DÉCOUVERTE
Committee code
1610
Committee name en
Electrical and Computer Engineering (RTI)
Committee name fr
Génie électrique et infomatique (OIR)
Area of application code
1206
Area of application group en
Advancement of knowledge
Area of application group fr
Avancement des connaissances
Area of application en
Engineering
Area of application fr
Génie
Research subject code
2519
Research subject group en
Electrical and electronic engineering
Research subject group fr
Microelectronics
Research subject en
Génie électrique et électronique
Research subject fr
Microélectronique
Application title
Chemical mechanical planarization a technology enabler for devices, circuits and microsystems innovation
Keyword
Advanced packaging; Chemical mechanical planarization; MEMS; Microfabrication; Nanoelectronic; Nanopatterning; Polishing; Semiconductor devces; Surface preparation; Wafer bonding
Application summary
We request this grant to update our chemical mechanical polishing/planarization (CMP) tool to develop enabling technologies in the fields of quantum, AI, MEMS, epitaxy, photovoltaic, optoelectronic, photonic and advanced packaging. We acquired our Alpsitec E460 CMP tool in 2009, thanks to the NSERC RTI program and other funds. Since then, CMP is now holding a central position in our research. In the last six years, 20 HQPs, 8 doctoral students (PhD), 2 postdoctoral fellows (PDF), 3 master students (MSc), 6 undergraduate students (UG) and 1 research associate (RA) acquired a hands-on experience on our CMP tool to execute their projects. CMP is crucial to many projects now being carried out by our group and not other etching technique or integration process can replace it. This year, the system went down for weeks because of a failure of its control PC and electronics. Even though after the replacement of the control PC and a complete calibration of the tool by the manufacturer and our technical staff to bring it back to a proper operating condition, the tool now suffers from unexpected and unplanned shutdown and the original specifications and performances are not attainable with the current temporary configuration. The funding of this grant will permit an upgrade of our current CMP tool and its electronics, preventing this way many possible failures over the next five to ten years. This is the most cost-effective way to ensure the continuation of our research, based on the reliability of our current system and the required budget to acquire a new one. This grant will not only support the 8 co-applicants of this RTI, but also the 19 researchers across Canada that have ongoing NSERC funded research projects or similar in collaboration with Université de Sherbrooke, in which they will benefit from the use of the upgraded CMP tool. The academic community and industries in Canada will also have access to the tool that is made available in the 3iT clean room facility either by direct access or as a service. The CMC Canadian Microsystem Corporation also offers this technology through its platform.
