Grant: Research Tools and Instruments
University of Waterloo
$147,117.00
Refurbishment of a 20-Year Old RIE System
FY 2022-23
Summary
The purpose of this Research Tool and Instruments (RTI) application is to request a grant to refurbish a 20- year old Reactive Ion Etching (RIE) System. The system is located in the Center for Integrated RF Engineering (CIRFE) clean room facility at the University of Waterloo, which is dedicated to the fabrication of micro and nano devices. The PECVD system is used for etching of silicon dioxides SiO2 or/and silicon nitride SiNx films. Over the past 20 years, this system has been the workhorse of the CIRFE clean room and has been an essential tool for successfully completing many fabrication processes and developing a wide range of novel devices. After going through few repair cycles over the past 20 years, some of the system hardware components are no longer commercially available. It became clear that the system needs an overall refurbishment to get it to the proper operational state. The system benefits more than 15 faculty members and their graduate students at the University of Waterloo who currently use the fabrication services of the CIRFE clean room. It also benefits other researchers in Canada who access the CIRFE clean room for thin film etching services.
Program
Research Tools and Instruments
Recipient
Location
Ontario, Canada
Recipient Type
Academia
Type
Grant
Source
NSERC's Awards Data
As published
Application id
RTI-2023-00507
Name nom
Mansour, Raafat
Department département
Electrical & Computer Engineering - Electrical & Computer Engineering
Organization id
33
Institution établissement
University of Waterloo
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2022
Competition year année de concours
2023
Award amount
147117
Program id
RTI
Program name en
Research Tools and Instruments
Program name fr
Outils et instruments de recherche
Group en
DISCOVERY RESEARCH
Group fr
RECHERCHE AXÉE SUR LA DÉCOUVERTE
Committee code
1610
Committee name en
Electrical and Computer Engineering (RTI)
Committee name fr
Génie électrique et infomatique (OIR)
Area of application code
805
Area of application group en
Information and communication services
Area of application group fr
Services d'information et de télécommunications
Area of application en
Communications technologies (satellites, radar, etc.)
Area of application fr
Technologie des télécommunications (satellites, radar,etc.)
Research subject code
2500
Research subject group en
Electrical and electronic engineering
Research subject group fr
Génie électrique et électronique
Research subject en
Electrical and electronic engineering
Research subject fr
Génie électrique et électronique
Installment
inst:1
Partie
1
Nb partie
1
Application title
Refurbishment of a 20-Year Old RIE System
Application summary
The purpose of this Research Tool and Instruments (RTI) application is to request a grant to refurbish a 20- year old Reactive Ion Etching (RIE) System. The system is located in the Center for Integrated RF Engineering (CIRFE) clean room facility at the University of Waterloo, which is dedicated to the fabrication of micro and nano devices. The PECVD system is used for etching of silicon dioxides SiO2 or/and silicon nitride SiNx films. Over the past 20 years, this system has been the workhorse of the CIRFE clean room and has been an essential tool for successfully completing many fabrication processes and developing a wide range of novel devices. After going through few repair cycles over the past 20 years, some of the system hardware components are no longer commercially available. It became clear that the system needs an overall refurbishment to get it to the proper operational state. The system benefits more than 15 faculty members and their graduate students at the University of Waterloo who currently use the fabrication services of the CIRFE clean room. It also benefits other researchers in Canada who access the CIRFE clean room for thin film etching services.
