Grant: Engage Grants Program
University of Ontario Institute of Technology
$25,000.00
Enhancing conductivity of laser fabricated porous silicon substrates with Graphene and Metal by Atomic Layer Deposition (ALD)
FY 2017-18
Summary
In this project, we introduce a new method for laser-based fabrication of nanofibrous silicon structures induced by laser pulses. Single crystalline silicon wafers are laser processed using a pulsed nanosecond laser system at different laser parameters before undergoing metallic and graphene Atomic Layer Deposition (ALD).Based on previous studies, when processed to be nanofibers, Si has shown promising biocompatibility; however, its conductivity is reduced due to oxidization. To overcome this, conductive biomaterial (e.g., gold, platinum, graphene, silver) embedding through ALD is proposed in this research as a means of controlling and further imparting electrical properties to laser-induced silicon oxide nanofibers. The metallic infused samples result in greater conductivities at higher embedded nanomaterial concentrations, especially in samples with smaller fiber sizes.The process developed through this research project will produce commercial quality sensors for IoT applications including health monitoring. The product can be used in data-centre interconnect with optical devices.
Program
Engage Grants Program
Location
Ontario, Canada
Recipient Type
Academia
Type
Grant
Source
NSERC's Awards Data
As published
Application id
516414-2017
Name nom
Kiani, Amirkianoosh
Department département
Automotive, Mechanical and Manufacturing Engineering
Organization id
19222
Institution établissement
University of Ontario Institute of Technology
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2017
Competition year année de concours
2017
Award amount
25000
Program id
EGP
Program name en
Engage Grants Program
Program name fr
Programme de subventions d'engagement partenariat
Group en
Research partnerships programs
Group fr
Programmes de partenariat
Committee code
1553
Committee name en
Ontario Internal Decision Committee
Committee name fr
Comité de décision interne pour l'Ontario
Area of application code
500
Area of application group en
Manufacturing processes and products
Area of application group fr
Procédés et produits industriels
Area of application en
Manufacturing processes and products
Area of application fr
Procédés et produits industriels
Research subject code
2100
Research subject group en
Mechanical engineering
Research subject group fr
Génie mécanique
Research subject en
Mechanical engineering
Research subject fr
Génie mécanique
Partie
1
Nb partie
1
Application title
Enhancing conductivity of laser fabricated porous silicon substrates with Graphene and Metal by Atomic Layer Deposition (ALD)
Keyword
NSERC
Application summary
In this project, we introduce a new method for laser-based fabrication of nanofibrous silicon structures induced by laser pulses. Single crystalline silicon wafers are laser processed using a pulsed nanosecond laser system at different laser parameters before undergoing metallic and graphene Atomic Layer Deposition (ALD).Based on previous studies, when processed to be nanofibers, Si has shown promising biocompatibility; however, its conductivity is reduced due to oxidization. To overcome this, conductive biomaterial (e.g., gold, platinum, graphene, silver) embedding through ALD is proposed in this research as a means of controlling and further imparting electrical properties to laser-induced silicon oxide nanofibers. The metallic infused samples result in greater conductivities at higher embedded nanomaterial concentrations, especially in samples with smaller fiber sizes.The process developed through this research project will produce commercial quality sensors for IoT applications including health monitoring. The product can be used in data-centre interconnect with optical devices.
