Grant: Research Tools and Instruments

The requested nanometer-Resolution High Speed Planar Positioning (nm-RHSPP) system is a multi-axis motion stage designed with air bearing technology to provide frictionless high-precision positioning in X-Y plane with nanometers accuracy. The nm-RHSPP includes linear motors (three magnetic motors), measuring systems (absolute encoders), air bearing assemblies, an advanced motion control system, and a Granite base. The nm-RHSPP provides 500 mm 500 mm X-Y plane with 1 nm resolution and velocity up to 2 m/s. The motors do not use mechanical components in the drivetrain, and they transmit the drive force to the motion platform without friction. This makes the nm-RHSPP system is suited for high-precision applications, such as inspection systems, laser marking, microscopy, and scanning ******This industrial equipment will be the first of its kind in Canada to provide planar high-precision motion with nanomter accuracy to the users at Memorial University of Newfoundland as well as in the province of Newfoundland and Labrador. The nm-RHSPP is crucial to support two research programs: (i) design of new precision motion systems for the next-generation lithography machines, and (ii) design and optimization of piezoelectric Micro-Electro-Mechanical Systems energy harvesters and microsystems for low-power electronic applications. Each year over 20 students under the applicants' supervision, who will be first trained on the equipment, will use it to conduct various research and academic activities. The students will acquire unique and specialized knowledge and hands-on skills on most recent high-precision high-speed motion systems in the industry of the semi-conductor manufacturing. It is also anticipated to attract researchers from industry in the province of Newfoundland and Labrador.******For the “design of new precision motion systems for the next-generation lithography machines” research, the main objective is to design a self-regulating smart-material-based reticle stage by integrating mutli-axial piezo-nano-positioning actuators to minimize the positioning errors between the main motion systems (reticle stage and wafer stage) in the future semiconductor manufacturing machines. This will lead to sub-nanometer accuracy of the extreme ultraviolet lithography process to manufacture faster, smarter, and lighter integrated circuits for new applications and future challenges, including microprocessors for the connected autonomous car and integrated circuits to enhance the multi-agent nanorobotic systems.For “design and optimization of piezoelectric Micro-Electro-Mechanical Systems energy harvesters and microsystems for low-power electronic applications”, the nm-RHSPP will help to confirm the theoretical studies and numerical simulations by enabling laboratory measurements of the proposed MEMS devices and enhance energy conversion efficiency of the MEMS energy harvesters.********