Grant: Research Tools and Instruments - Category 1 (<$150,000)
University of Ottawa
$139,935.00
Optical mask aligner and plasma cleaner for core nano-fabrication facility
EF 2013-14
Résumé
This proposal seeks to acquire tools which will be added to a core nanofabrication facility at the University of Ottawa. This facility is accessed by several internal and external users to fabricate nanostructures of interest in photonics, microfluidics, MEMS (microelectromechanical systems) and electronics for applications across varied fields such as biomedical engineering, biophysics, alternative energy, and information and communications technologies. This is the only non-captive accessible nanofabrication facility in Eastern Ontario - its user base, which consists mostly of students and post-doctoral fellows, spans the region, reaching into Montreal. Researchers from several departments within the University of Ottawa, from Carleton and McGill Universities, and from the National Research Council depend on this facility for critical aspects of their work. The facility also supports several international research projects and university-industry research partnerships. This proposal seeks funding to add optical lithography to the capabilities of our nanofabrication facility. To this end, two tools are requested: Item 1 is an optical mask aligner to expose photoresist on a wafer using a mask bearing the features to be transferred. The aligner selected is reliable, cost-effective and ideally-suited to university research, given the tool's flexibility and compactness. The aligner integrates front-side with IR back-side alignment, allowing front-to-back alignments on IR-transmitting wafers such as Si, GaAs and InP wafers. The aligner will allow features as small as 1 ?m to be routinely defined in resist over a full wafer. Item 2 is a plasma cleaning system to clean samples after resist development, ensuring successful subsequent processing and reproducibility. Lithography process development, optimisation and control require frequent iterations, making an optical mask aligner and plasma cleaning system standard tools in fabrication facilities.
Programme
Research Tools and Instruments - Category 1 (<$150,000)
Bénéficiaire
Emplacement
Ontario, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data
Tel que publié
Application id
458616-2014
Name nom
Berini, Pierre
Department département
Electrical Engineering and Computer Science , School of
Organization id
28
Institution établissement
University of Ottawa
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2013
Competition year année de concours
2014
Award amount
139935
Program id
EQPEQ
Program name en
Research Tools and Instruments - Category 1 (<$150,000)
Program name fr
Outils et instruments de recherche - catégorie 1 (<150 000$)
Group en
Discovery grants programs
Group fr
Programmes de subventions à la découverte
Committee code
1510
Committee name en
Electrical and Computer Engineering
Committee name fr
Génie électrique et informatique
Area of application code
802
Area of application group en
Information and communication services
Area of application group fr
Services d'information et de télécommunications
Area of application en
Information systems and technology
Area of application fr
Systèmes d'information et technologie de l'information
Research subject code
2505
Research subject group en
Electrical and electronic engineering
Research subject group fr
Génie électrique et électronique
Research subject en
Photon devices
Research subject fr
Dispositifs photoniques
Partie
1
Nb partie
1
Application title
Optical mask aligner and plasma cleaner for core nano-fabrication facility
Keyword
NSERC
Application summary
This proposal seeks to acquire tools which will be added to a core nanofabrication facility at the University of Ottawa. This facility is accessed by several internal and external users to fabricate nanostructures of interest in photonics, microfluidics, MEMS (microelectromechanical systems) and electronics for applications across varied fields such as biomedical engineering, biophysics, alternative energy, and information and communications technologies. This is the only non-captive accessible nanofabrication facility in Eastern Ontario - its user base, which consists mostly of students and post-doctoral fellows, spans the region, reaching into Montreal. Researchers from several departments within the University of Ottawa, from Carleton and McGill Universities, and from the National Research Council depend on this facility for critical aspects of their work. The facility also supports several international research projects and university-industry research partnerships. This proposal seeks funding to add optical lithography to the capabilities of our nanofabrication facility. To this end, two tools are requested: Item 1 is an optical mask aligner to expose photoresist on a wafer using a mask bearing the features to be transferred. The aligner selected is reliable, cost-effective and ideally-suited to university research, given the tool's flexibility and compactness. The aligner integrates front-side with IR back-side alignment, allowing front-to-back alignments on IR-transmitting wafers such as Si, GaAs and InP wafers. The aligner will allow features as small as 1 ?m to be routinely defined in resist over a full wafer. Item 2 is a plasma cleaning system to clean samples after resist development, ensuring successful subsequent processing and reproducibility. Lithography process development, optimisation and control require frequent iterations, making an optical mask aligner and plasma cleaning system standard tools in fabrication facilities.