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Grant: Research Tools and Instruments - Category 1 (<$150,000)

University of Waterloo

$150,000.00

Critically Needed Replacement of an Atomic Force Microscope and Nanolithography System

EF 2012-13

Résumé
This minor equipment application seeks the support for a critical replacement of a broken Atomic Force Microscope (AFM) and Nanolithography system at the University of Waterloo. Equipped with multiple techniques, including Tunnelling AFM and Scanning Surface Resistance Microscopy, in-liquid imaging, and nanolithography, this Nanoscope IV NanoMan AFM system represented one of the best commercial AFM instruments in the world. The Waterloo machine was also one of the very few AFM systems in Canada that were capable of not just nanolithography but also the aforementioned nanoprobing techniques with nanoscale resolution. This AFM system has been in operation since early 2003 and has been under heavy use, serving the research needs of over 15 local research groups from the University of Waterloo and 7 groups from other Canadian universities. In late 2009, this system has suffered devastating damages by a series of power interruptions during a thunderstom. With the manufacturer recently decided to terminate support of this generation of AFM systems, this effectively rules out any repair option and leaves us no choice but to apply for a replacement system. Specifically, the requested support will allow us to replace this AFM system with similar capabilities. This critical replacement will bring the Waterloo AFM facility back up to full operation, with its superior performance in imaging, nanolithography, and other nanoprobing techniques. The requested replacement system is critically needed for the continued survival of the diverse materials science and engineering research programs at Waterloo, and over 35 graduate thesis projects depend on this instrument.
Programme
Research Tools and Instruments - Category 1 (<$150,000)
Emplacement
Ontario, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data

Tel que publié

Application id
439353-2013
Name nom
Leung, Tong
Department département
Chemistry
Organization id
33
Institution établissement
University of Waterloo
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2012
Competition year année de concours
2013
Award amount
150000
Program id
EQPEQ
Program name en
Research Tools and Instruments - Category 1 (<$150,000)
Program name fr
Outils et instruments de recherche - catégorie 1 (<150 000$)
Group en
Discovery grants programs
Group fr
Programmes de subventions à la découverte
Committee code
1504
Committee name en
Chemistry
Committee name fr
Chimie
Area of application code
1208
Area of application group en
Advancement of knowledge
Area of application group fr
Avancement des connaissances
Area of application en
Materials sciences
Area of application fr
Sciences des matériaux
Research subject code
3400
Research subject group en
Physical chemistry
Research subject group fr
Chimie physique
Research subject en
Physical chemistry
Research subject fr
Chimie physique
Partie
1
Nb partie
1
Application title
Critically Needed Replacement of an Atomic Force Microscope and Nanolithography System
Keyword
NSERC
Application summary
This minor equipment application seeks the support for a critical replacement of a broken Atomic Force Microscope (AFM) and Nanolithography system at the University of Waterloo. Equipped with multiple techniques, including Tunnelling AFM and Scanning Surface Resistance Microscopy, in-liquid imaging, and nanolithography, this Nanoscope IV NanoMan AFM system represented one of the best commercial AFM instruments in the world. The Waterloo machine was also one of the very few AFM systems in Canada that were capable of not just nanolithography but also the aforementioned nanoprobing techniques with nanoscale resolution. This AFM system has been in operation since early 2003 and has been under heavy use, serving the research needs of over 15 local research groups from the University of Waterloo and 7 groups from other Canadian universities. In late 2009, this system has suffered devastating damages by a series of power interruptions during a thunderstom. With the manufacturer recently decided to terminate support of this generation of AFM systems, this effectively rules out any repair option and leaves us no choice but to apply for a replacement system. Specifically, the requested support will allow us to replace this AFM system with similar capabilities. This critical replacement will bring the Waterloo AFM facility back up to full operation, with its superior performance in imaging, nanolithography, and other nanoprobing techniques. The requested replacement system is critically needed for the continued survival of the diverse materials science and engineering research programs at Waterloo, and over 35 graduate thesis projects depend on this instrument.