Grant: Research Tools and Instruments - Category 1 (<$150,000)
Simon Fraser University
$150,000.00
Mask Aligner
EF 2011-12
Résumé
We ask funding to purchase an infrared/visible mask alignment and exposure system. This basic mask aligner will serve the needs of all lithographic exposure processes for all the applicants in this proposal. This tool is urgently needed to sustain and enhance the research capacity and productivity of the applicants and more than 100 researchers who are using our facilities. The mask aligner will be used in applied research in a wide area ranging from microfluidic compact diagnostic systems to smart automotive sensors and actuator systems, Micro-Electromechanical System (MEMS) technology and also development of novel polymer MEMS, and nano-material embedded soft-lithography.
Programme
Research Tools and Instruments - Category 1 (<$150,000)
Bénéficiaire
Emplacement
British Columbia, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data
Tel que publié
Application id
423282-2012
Name nom
Parameswaran, Ash
Department département
Engineering Science, School of
Organization id
5
Institution établissement
Simon Fraser University
Province en
British Columbia
Province fr
Colombie-Britannique
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2011
Competition year année de concours
2012
Award amount
150000
Program id
EQPEQ
Program nane en
Research Tools and Instruments - Category 1 (<$150,000)
Program name fr
Outils et instruments de recherche - catégorie 1 (<150 000$)
Group en
Discovery grants programs
Group fr
Programmes de subventions à la découverte
Committee code
1510
Committee name en
Electrical and Computer Engineering
Committee name fr
Génie électrique et informatique
Area of application code
1206
Area of application group en
Advancement of knowledge
Area of application group fr
Avancement des connaissances
Area of application en
Engineering
Area of application fr
Génie
Research subject code
1700
Research subject group en
Design and manufacturing
Research subject group fr
Conception et fabrication
Research subject en
Design and manufacturing
Research subject fr
Conception et fabrication
Partie
1
Nb partie
1
Application title
Mask Aligner
Keyword
NSERC
Application summary
We ask funding to purchase an infrared/visible mask alignment and exposure system. This basic mask aligner will serve the needs of all lithographic exposure processes for all the applicants in this proposal. This tool is urgently needed to sustain and enhance the research capacity and productivity of the applicants and more than 100 researchers who are using our facilities. The mask aligner will be used in applied research in a wide area ranging from microfluidic compact diagnostic systems to smart automotive sensors and actuator systems, Micro-Electromechanical System (MEMS) technology and also development of novel polymer MEMS, and nano-material embedded soft-lithography.
