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Grant: Strategic Projects - Group

University of Western Ontario

$206,500.00

Vacuum polyradical deposition (VPRD) techniques for specialty nanoelectronics

EF 2017-18

Résumé
The Canadian plastics and polymer manufacturing sector is in need of a rejuvenation, while Canada'sinformation and communication technology (ICT) manufacturing is booming. Our 'big' data society and theprogress of ICT generate a continuous demand for new manufacturing solutions that, at the required levels ofthinness, simplicity, and costs, are not currently available from silicon electronics, and 'plastic' electronicsbased on organic polymers have often been suggested as promising alternative. This has created a pressingneed for the development of advanced, environmentally-friendly manufacturing methods for the production ofelectronic-grade 'plastic' materials. Polyradicals, polymers in which each repeated unit supports an unpairedelectron, are at the forefront of research in 'flash' memories, data storage units capable to retain informationwithout any external power source, but are writable an unlimited number of times. This proposal capitalizes onthe recent record achievement of the Fanchini-Gilroy team that has demonstrated and patented ultrathin flashmemory devices from a newly designed polyradical, poly[1,5-diisopropyl-3-(cis-5-norbornene-exo-2,3-dicarboxiimide)-6-oxo-verdazyl] (P6OV), with the thinnest active layer (10 nm) ever obtained, muchthinner than their commercial silicon counterparts. To capitalize on this startling discovery, an industriallyscalable system with the potential to lead to integrated electronics from organic polyradicals must beimplemented. In partnership with Plasmionique, Canada's largest producer of vacuum polymer depositionsystems for electronics , the Fanchini-Gilroy team will develop the prototype of a new vacuum polyradicaldeposition (VPRD) reactor that will be commercialized by our industrial partner, enabling solvent-free andenvironmentally-friendly mass production of polyradicals, with strong benefits to Canada. A prototype of aflash memory integrating a large number of memory components onto a single chip will also be demonstratedwith the new VPRD fabrication system, which will feature device patterning technology developed at theWestern University Nanofabrication Facility.
Programme
Strategic Projects - Group
Emplacement
Ontario, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data

Tel que publié

Application id
506356-2017
Name nom
Fanchini, Giovanni
Department département
Physics and Astronomy
Organization id
36
Institution établissement
University of Western Ontario
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2017
Competition year année de concours
2017
Award amount
206500
Program id
STPGP
Program name en
Strategic Projects - Group
Program name fr
Projets stratégiques - De groupe
Group en
Research partnerships programs
Group fr
Programmes de partenariat
Committee code
1586
Committee name en
Strategic Projects - Advanced Manufacturing
Committee name fr
Projets stratégiques - Fabrication de pointe
Area of application code
500
Area of application group en
Manufacturing processes and products
Area of application group fr
Procédés et produits industriels
Area of application en
Manufacturing processes and products
Area of application fr
Procédés et produits industriels
Research subject code
3302
Research subject group en
Condensed matterphysics
Research subject group fr
Physique de la matière condensée
Research subject en
Electronic properties of solids
Research subject fr
Propriétés électroniques des solides
Partie
1
Nb partie
3
Application title
Vacuum polyradical deposition (VPRD) techniques for specialty nanoelectronics
Keyword
NSERC
Application summary
The Canadian plastics and polymer manufacturing sector is in need of a rejuvenation, while Canada'sinformation and communication technology (ICT) manufacturing is booming. Our 'big' data society and theprogress of ICT generate a continuous demand for new manufacturing solutions that, at the required levels ofthinness, simplicity, and costs, are not currently available from silicon electronics, and 'plastic' electronicsbased on organic polymers have often been suggested as promising alternative. This has created a pressingneed for the development of advanced, environmentally-friendly manufacturing methods for the production ofelectronic-grade 'plastic' materials. Polyradicals, polymers in which each repeated unit supports an unpairedelectron, are at the forefront of research in 'flash' memories, data storage units capable to retain informationwithout any external power source, but are writable an unlimited number of times. This proposal capitalizes onthe recent record achievement of the Fanchini-Gilroy team that has demonstrated and patented ultrathin flashmemory devices from a newly designed polyradical, poly[1,5-diisopropyl-3-(cis-5-norbornene-exo-2,3-dicarboxiimide)-6-oxo-verdazyl] (P6OV), with the thinnest active layer (10 nm) ever obtained, muchthinner than their commercial silicon counterparts. To capitalize on this startling discovery, an industriallyscalable system with the potential to lead to integrated electronics from organic polyradicals must beimplemented. In partnership with Plasmionique, Canada's largest producer of vacuum polymer depositionsystems for electronics , the Fanchini-Gilroy team will develop the prototype of a new vacuum polyradicaldeposition (VPRD) reactor that will be commercialized by our industrial partner, enabling solvent-free andenvironmentally-friendly mass production of polyradicals, with strong benefits to Canada. A prototype of aflash memory integrating a large number of memory components onto a single chip will also be demonstratedwith the new VPRD fabrication system, which will feature device patterning technology developed at theWestern University Nanofabrication Facility.