Grant: Collaborative Research and Development Grants
Institut national de la recherche scientifique
$160,000.00
State-of-the-art nanofabrication processes for manufacturing integrated photonic devices based on silicon nitride
EF 2019-20
Résumé
The photonic industry is following into the footsteps of microelectronic manufacturers by exploring how to increase the level of integration of optical products in order to reduce the cost of current optical interconnects. This has led to the development of silicon photonics, which takes advantage of the state-of-the-art fabrication processes and massive capital investment made by the microelectronic industry to produce affordable components. Implementing efficient optical functionalities with materials originally developed to build and package electronic circuits is challenging. To address this issue, AEPONYX is developing a microfabricated platform that combines integrated optical components based on silicon nitride with microelectromechanical systems (MEMS). Preliminary studies have clearly shown that the bottleneck of such a technology is related to the nanofabrication processes used for manufacturing these integrated photonic devices. In this context, the team composed of researchers from INRS, UQAM and AEPONYX proposes to push the limits of nanofabrication technologies (electron beam lithography and nanometer pattern transfer) in order to (i) control the critical dimensions and the sidewall profiles of integrated photonic devices at the nanoscale level, (ii) minimize the sidewall roughness of the waveguides, and (iii) develop a robust and reliable nanofabrication process at the lowest cost. Validation of such an optimized nanofabrication process will be performed by manufacturing dense wavelength division multiplexing (DWDM) filters arranged in an 8-channel wavelength selective optical filter insensitive to polarization and compatible with the wavelength channel allocation specified in the ITU G.989.2 NG-PON2 standard. The results of the investigation performed in the proposed project will directly impact the quality and the pace at which products based on MEMS and integrated optics will be able to be mass manufactured by AEPONYX and its industrial collaborators C2MI, Teledyne Dalsa and IBM.
Programme
Collaborative Research and Development Grants
Bénéficiaire
Emplacement
Quebec, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data
Tel que publié
Application id
530034-2018
Name nom
Chaker, Mohamed
Department département
Énergie Matériaux Télécommunications, Centre - Varennes
Organization id
56
Institution établissement
Institut national de la recherche scientifique
Province en
Québec
Province fr
Québec
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2019
Competition year année de concours
2018
Award amount
160000
Program id
CRDPJ
Program name en
Collaborative Research and Development Grants
Program name fr
Subventions de recherche et développement coopérative
Group en
RESEARCH PARTNERSHIPS
Group fr
PARTENARIATS DE RECHERCHE
Committee code
96
Committee name en
RPP Internal Decision Cttee
Committee name fr
Cté de décision interne - PPR
Area of application code
514
Area of application group en
Manufacturing processes and products
Area of application group fr
Procédés et produits industriels
Area of application en
Communications equipment
Area of application fr
Matériel de télécommunications
Research subject code
3112
Research subject group en
Physics
Research subject group fr
Physique
Research subject en
Photonics
Research subject fr
Photonique
Installment
inst:2 - 2
Partie
2
Nb partie
2
Application title
State-of-the-art nanofabrication processes for manufacturing integrated photonic devices based on silicon nitride
Keyword
NSERC
Application summary
The photonic industry is following into the footsteps of microelectronic manufacturers by exploring how to increase the level of integration of optical products in order to reduce the cost of current optical interconnects. This has led to the development of silicon photonics, which takes advantage of the state-of-the-art fabrication processes and massive capital investment made by the microelectronic industry to produce affordable components. Implementing efficient optical functionalities with materials originally developed to build and package electronic circuits is challenging. To address this issue, AEPONYX is developing a microfabricated platform that combines integrated optical components based on silicon nitride with microelectromechanical systems (MEMS). Preliminary studies have clearly shown that the bottleneck of such a technology is related to the nanofabrication processes used for manufacturing these integrated photonic devices. In this context, the team composed of researchers from INRS, UQAM and AEPONYX proposes to push the limits of nanofabrication technologies (electron beam lithography and nanometer pattern transfer) in order to (i) control the critical dimensions and the sidewall profiles of integrated photonic devices at the nanoscale level, (ii) minimize the sidewall roughness of the waveguides, and (iii) develop a robust and reliable nanofabrication process at the lowest cost. Validation of such an optimized nanofabrication process will be performed by manufacturing dense wavelength division multiplexing (DWDM) filters arranged in an 8-channel wavelength selective optical filter insensitive to polarization and compatible with the wavelength channel allocation specified in the ITU G.989.2 NG-PON2 standard. The results of the investigation performed in the proposed project will directly impact the quality and the pace at which products based on MEMS and integrated optics will be able to be mass manufactured by AEPONYX and its industrial collaborators C2MI, Teledyne Dalsa and IBM.