Grant: Collaborative Research and Development Grants
University of Waterloo
$114,500.00
Fabrication of high aspect ratio AFM probes with diamond apex_x000d_
EF 2020-21
Résumé
A widely used tool in nano-scale characterization is the Atomic Force Microscope (AFM), with popular applications in large semiconductor companies such as IBM, Intel, AMD and Seagate for the quality assurance of their chips and small electronics. It is also widely used in a variety of research fields and emerging technologies. The most important part of the AFM is the probe or tip which "feels" the sample surface and creates a three-dimensional image of the specimen surface. A major drawback in AFM usage is the lifetime of its disposable probe which is the main component in defining the resolution and quality of the images. Conventionally, these probes are made of silicon; but due to poor mechanical properties of silicon, some manufacturers have switched to other alternatives such as silicon nitride, carbon nanotubes, and diamond coated silicon probes. Although these probes have shown a longer lifetime than the regular silicon probes, they are significantly more expensive. In this project, we will develop a method to fabricate high aspect ratio diamond AFM probes at low cost. We plan to employ electron beam lithography to fabricate these probes from SOI wafers, with significantly reduced fabrication cost than high aspect ratio diamond tips made by focused ion beam milling. Our tip apex will also be considerably sharper than diamond tips made by coating a diamond film onto a silicon tip. We will increase the reproducibility to streamline the batch manufacturing process for this product.
Programme
Collaborative Research and Development Grants
Bénéficiaire
Emplacement
Ontario, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data
Tel que publié
Application id
543529-2019
Name nom
Cui, Bo
Department département
Electrical & Computer Engineering
Organization id
33
Institution établissement
University of Waterloo
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2020
Competition year année de concours
2019
Award amount
114500
Program id
CRDPJ
Program name en
Collaborative Research and Development Grants
Program name fr
Subventions de recherche et développement coopérative
Group en
Research partnerships programs
Group fr
Programmes de partenariat
Committee code
96
Committee name en
RPP Internal Decision Cttee
Committee name fr
Cté de décision interne - PPR
Area of application code
515
Area of application group en
Manufacturing processes and products
Area of application group fr
Procédés et produits industriels
Area of application en
Instrumentation technology
Area of application fr
Technologie de l'instrumentation
Research subject code
2523
Research subject group en
Electrical and electronic engineering
Research subject group fr
Génie électrique et électronique
Research subject en
Semiconductor fabrication and packaging
Research subject fr
Fabrication et mise sous enveloppe de semi-conducteurs
Installment
inst:2 - 2
Partie
1
Nb partie
2
Application title
Fabrication of high aspect ratio AFM probes with diamond apex_x000d_
Keyword
NSERC
Application summary
A widely used tool in nano-scale characterization is the Atomic Force Microscope (AFM), with popular applications in large semiconductor companies such as IBM, Intel, AMD and Seagate for the quality assurance of their chips and small electronics. It is also widely used in a variety of research fields and emerging technologies. The most important part of the AFM is the probe or tip which "feels" the sample surface and creates a three-dimensional image of the specimen surface. A major drawback in AFM usage is the lifetime of its disposable probe which is the main component in defining the resolution and quality of the images. Conventionally, these probes are made of silicon; but due to poor mechanical properties of silicon, some manufacturers have switched to other alternatives such as silicon nitride, carbon nanotubes, and diamond coated silicon probes. Although these probes have shown a longer lifetime than the regular silicon probes, they are significantly more expensive. In this project, we will develop a method to fabricate high aspect ratio diamond AFM probes at low cost. We plan to employ electron beam lithography to fabricate these probes from SOI wafers, with significantly reduced fabrication cost than high aspect ratio diamond tips made by focused ion beam milling. Our tip apex will also be considerably sharper than diamond tips made by coating a diamond film onto a silicon tip. We will increase the reproducibility to streamline the batch manufacturing process for this product.