Grant: Research Tools and Instruments - Category 1 (<$150,000)
University of Western Ontario
$53,000.00
Profilometer for Controling Etching and Deposition Rates of Materials in Nanofabrication Processes
EF 2012-13
Résumé
This proposal concerns the acquisition of a contact profilometer for thin film characterization. The nanofabrication facility at the Western University (http://nanofab.uwo.ca) is an open access facility for academic research groups as well as industrial partners that wish to fabricate devices that need advanced micro- and nano-fabrication techniques. Such techniques offered by the nanofabrication facility include electron beam lithography, surface etching, and metal and polymer deposition as thin films. The equipment is located in a clean room environment and supports the training of a large number of HQP working within more than 60 research groups at Western and nearby institutions and industries. Importantly, more than 180 students (undergrad, graduate, postdoctoral fellow) from different disciplines ranging from chemistry, physics, engineering as well as medical science utilize the facility. Alumni of the facility have been recruited to academic positions at prestigious institutions such as Ottawa University, Boston University and MIT, or industry players such as Imperial oil, IBM, Ford and General motors. The requested profilometer is an instrument needed to characterize thin films. It is capable of precise measurements of film thickness and roughness, and can evaluate large surfaces in order to measure the homogeneity of deposited thin films. In the nanofabrication facility, thin films of polymers are prepared on a daily basis. The polymer thin films deposited by spin coating are used as photoresists as well as for constructing microfluidic devices (polydimethyl siloxane). Furthermore, deposition of metals (e.g. Au, Ti, Cr, Ag) and metal oxydes (ITO, alumina) is performed daily and aides in the fabrication of nanoscale and microscale devices and antennae for plasmonic platforms. It is therefore of critical importance to precisely control the thickness of the deposited materials as well as to calibrate the methods and instruments used to deposit the materials. Contact profilometry is simple for users to learn and reasonable cost. It is capable of precise measures of film thickness, roughness and homogeneity and is a requisite in all nanofabrication processes.
Programme
Research Tools and Instruments - Category 1 (<$150,000)
Bénéficiaire
Emplacement
Ontario, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data
Tel que publié
Application id
439329-2013
Name nom
LagugnéLabarthet, François
Department département
Chemistry
Organization id
36
Institution établissement
University of Western Ontario
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2012
Competition year année de concours
2013
Award amount
53000
Program id
EQPEQ
Program name en
Research Tools and Instruments - Category 1 (<$150,000)
Program name fr
Outils et instruments de recherche - catégorie 1 (<150 000$)
Group en
Discovery grants programs
Group fr
Programmes de subventions à la découverte
Committee code
1504
Committee name en
Chemistry
Committee name fr
Chimie
Area of application code
1206
Area of application group en
Advancement of knowledge
Area of application group fr
Avancement des connaissances
Area of application en
Engineering
Area of application fr
Génie
Research subject code
3402
Research subject group en
Physical chemistry
Research subject group fr
Chimie physique
Research subject en
Surface and interfacial chemistry
Research subject fr
Chimie des surfaces et des interfaces
Partie
1
Nb partie
1
Application title
Profilometer for Controling Etching and Deposition Rates of Materials in Nanofabrication Processes
Keyword
NSERC
Application summary
This proposal concerns the acquisition of a contact profilometer for thin film characterization. The nanofabrication facility at the Western University (http://nanofab.uwo.ca) is an open access facility for academic research groups as well as industrial partners that wish to fabricate devices that need advanced micro- and nano-fabrication techniques. Such techniques offered by the nanofabrication facility include electron beam lithography, surface etching, and metal and polymer deposition as thin films. The equipment is located in a clean room environment and supports the training of a large number of HQP working within more than 60 research groups at Western and nearby institutions and industries. Importantly, more than 180 students (undergrad, graduate, postdoctoral fellow) from different disciplines ranging from chemistry, physics, engineering as well as medical science utilize the facility. Alumni of the facility have been recruited to academic positions at prestigious institutions such as Ottawa University, Boston University and MIT, or industry players such as Imperial oil, IBM, Ford and General motors. The requested profilometer is an instrument needed to characterize thin films. It is capable of precise measurements of film thickness and roughness, and can evaluate large surfaces in order to measure the homogeneity of deposited thin films. In the nanofabrication facility, thin films of polymers are prepared on a daily basis. The polymer thin films deposited by spin coating are used as photoresists as well as for constructing microfluidic devices (polydimethyl siloxane). Furthermore, deposition of metals (e.g. Au, Ti, Cr, Ag) and metal oxydes (ITO, alumina) is performed daily and aides in the fabrication of nanoscale and microscale devices and antennae for plasmonic platforms. It is therefore of critical importance to precisely control the thickness of the deposited materials as well as to calibrate the methods and instruments used to deposit the materials. Contact profilometry is simple for users to learn and reasonable cost. It is capable of precise measures of film thickness, roughness and homogeneity and is a requisite in all nanofabrication processes.