Grant: Research Tools and Instruments - Category 1 (<$150,000)
University of Windsor
$120,859.00
Self-assembled monolayers on ultrasmooth surfaces prepared by chemical-mechanical polishing
EF 2006-07
Résumé
The proposed research will study self-assembled monolayers (SAMs) - nanometre-thick organic films that form spontaneously on surfaces - as barrier layers for future microelectronic devices. As device sizes shrink into the nanoscale regime, they require increasingly thin barrier layers to isolate components and improve performance. For SAMs to perform as barriers, it is necessary to reduce defects (regions of molecular disorder) caused by roughness of the underlying surface. We are requesting funds for a chemical-mechanical polishing (CMP) system, which is an industrial technique capable of polishing surfaces to nearly atomic smoothness. We will study SAMs formed on smooth metal surfaces prepared using CMP and study the relationship between surface roughness and SAM defect densities. We will establish the relationship between defects in SAMs and their efficacy as barriers to oxidation, corrosion and diffusion. These fundamental studies will be the foundation for the application of SAMs in future nanoscale devices.
Programme
Research Tools and Instruments - Category 1 (<$150,000)
Bénéficiaire
Emplacement
Ontario, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data
Tel que publié
Application id
344769-2007
Name nom
Carmichael, Tricia
Department département
Chemistry and Biochemistry
Organization id
37
Institution établissement
University of Windsor
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2006
Competition year année de concours
2007
Award amount
120859
Program id
EQPEQ
Program name en
Research Tools and Instruments - Category 1 (<$150,000)
Program name fr
Outils et instruments de recherche - catégorie 1 (<150 000$)
Group en
Discovery grants programs
Group fr
Programmes de subventions à la découverte
Committee code
24
Committee name en
Inorganic & Organic Chemistry
Committee name fr
Chimie inorg. et org.
Area of application code
1208
Area of application group en
Advancement of knowledge
Area of application group fr
Avancement des connaissances
Area of application en
Materials sciences
Area of application fr
Sciences des matériaux
Research subject code
2000
Research subject group en
Materials science and technology
Research subject group fr
Science et technologie des matériaux
Research subject en
Materials science and technology
Research subject fr
Science et technologie des matériaux
Partie
1
Nb partie
1
Application title
Self-assembled monolayers on ultrasmooth surfaces prepared by chemical-mechanical polishing
Keyword
NA
Application summary
The proposed research will study self-assembled monolayers (SAMs) - nanometre-thick organic films that form spontaneously on surfaces - as barrier layers for future microelectronic devices. As device sizes shrink into the nanoscale regime, they require increasingly thin barrier layers to isolate components and improve performance. For SAMs to perform as barriers, it is necessary to reduce defects (regions of molecular disorder) caused by roughness of the underlying surface. We are requesting funds for a chemical-mechanical polishing (CMP) system, which is an industrial technique capable of polishing surfaces to nearly atomic smoothness. We will study SAMs formed on smooth metal surfaces prepared using CMP and study the relationship between surface roughness and SAM defect densities. We will establish the relationship between defects in SAMs and their efficacy as barriers to oxidation, corrosion and diffusion. These fundamental studies will be the foundation for the application of SAMs in future nanoscale devices.
