Grant: Research Tools and Instruments
University of Waterloo
$144,774.00
Ion Beam Milling System
EF 2015-16
Résumé
The purpose of this Research Tool and Instruments (RTI) grant proposal is to purchase an Ion Milling System for applications in the field of Micro-Electro-Mechanical Systems (MEMS), millimeter-wave, and opto-electronics. The Ion Milling System is a key processing tool in any micro-fabrication facility. This system is highly beneficial for selectively removing thin film materials that cannot be etched using conventional plasma etch techniques such as Pt, Pd, Au, etc. The tool will be fitted with an electrical feedthrough to interrogate the device to be etched between ion exposure steps. The system will be instrumental in investigating the novel concept of integrating our chip-scale MEMS-based atomic force microscopes (AFM) with the requested tool to provide in-situ metrology and end point detection with unprecedented accuracy and resolution. Thus, the tool will be used not only to meet our etching needs but also to investigate the possibilities of enhancing the performance of ion milling techniques through the use of in-situ AFM.
The tool will be located in a clean room facility at the University of Waterloo that is dedicated to the fabrication of MEMS and gold-based thin film devices. The proposed tool will benefit more than 20 faculty members and 50 graduate students at the University of Waterloo who currently use this clean room facility. Some of the current research projects that are relevant to this proposal are: 1) radio frequency (RF) MEMS, 2) chip scale scanning probe microscopes, 3) micro-fabrication and packaging, 4) fabrication of neural micro-electrodes, 5) MEMS/NEMS sensors, 6) MEMS-based photonic devices micro-power generators, and 7) millimeter-wave integrated receiver systems.
All of the above mentioned research projects will directly benefit from the requested tool. Most of these projects are supported by industry. A large number of companies in Canada that are involved in wireless communication, instrumentation, automotive and biomedical applications will also benefit from the requested RTI tool.
Programme
Research Tools and Instruments
Bénéficiaire
Emplacement
Ontario, Canada
Type de bénéficiaire
Academia
Type
Grant
Source
NSERC's Awards Data
Tel que publié
Application id
RTI-2016-00069
Name nom
Mansour, Raafat
Department département
Electrical & Computer Engineering - Electrical & Computer Engineering
Organization id
33
Institution établissement
University of Waterloo
Province en
Ontario
Province fr
Ontario
Country en
CANADA
Country fr
CANADA
Fiscal year exercice financier
2015
Competition year année de concours
2016
Award amount
144774
Program id
RTI
Program name en
Research Tools and Instruments
Program name fr
Outils et instruments de recherche
Group en
Discovery grants programs
Group fr
Programmes de subventions à la découverte
Committee code
1609
Committee name en
Engineering (RTI)
Committee name fr
Génie (OIR)
Area of application code
805
Area of application group en
Information and communication services
Area of application group fr
Services d'information et de télécommunications
Area of application en
Communications technologies (satellites, radar, etc.)
Area of application fr
Technologie des télécommunications (satellites, radar,etc.)
Research subject code
2520
Research subject group en
Electrical and electronic engineering
Research subject group fr
Génie électrique et électronique
Research subject en
Microwave and millimeterwave devices, circuits and technologies
Research subject fr
Dispositifs, circuits et technologie hyperfréquences et d'ondes millimétriques
Partie
1
Nb partie
1
Application title
Ion Beam Milling System
Keyword
NSERC
Application summary
<p>The purpose of this Research Tool and Instruments (RTI) grant proposal is to purchase an Ion Milling System for applications in the field of Micro-Electro-Mechanical Systems (MEMS), millimeter-wave, and opto-electronics. The Ion Milling System is a key processing tool in any micro-fabrication facility. This system is highly beneficial for selectively removing thin film materials that cannot be etched using conventional plasma etch techniques such as Pt, Pd, Au, etc. The tool will be fitted with an electrical feedthrough to interrogate the device to be etched between ion exposure steps. The system will be instrumental in investigating the novel concept of integrating our chip-scale MEMS-based atomic force microscopes (AFM) with the requested tool to provide in-situ metrology and end point detection with unprecedented accuracy and resolution. Thus, the tool will be used not only to meet our etching needs but also to investigate the possibilities of enhancing the performance of ion milling techniques through the use of in-situ AFM. <br />
<br />
The tool will be located in a clean room facility at the University of Waterloo that is dedicated to the fabrication of MEMS and gold-based thin film devices. The proposed tool will benefit more than 20 faculty members and 50 graduate students at the University of Waterloo who currently use this clean room facility. Some of the current research projects that are relevant to this proposal are: 1) radio frequency (RF) MEMS, 2) chip scale scanning probe microscopes, 3) micro-fabrication and packaging, 4) fabrication of neural micro-electrodes, 5) MEMS/NEMS sensors, 6) MEMS-based photonic devices micro-power generators, and 7) millimeter-wave integrated receiver systems.<br />
<br />
All of the above mentioned research projects will directly benefit from the requested tool. Most of these projects are supported by industry. A large number of companies in Canada that are involved in wireless communication, instrumentation, automotive and biomedical applications will also benefit from the requested RTI tool. </p>